Chamber Clean Made Easy!
Remote Plasma Sources from MKS include the ASTRON®hf reactive gas generator designed to clean undesired deposits from interior walls of CVD process chambers. By generating atomic fluorine that reacts with waste deposits in the chamber, new gases are formed that are readily scrubbed to minimize the environmental impact. In addition, the field-proven ASTRON®hf remote source reduces wear and tear on the process chamber compared to other cleaning methods.
Remote Plasma Sources from MKS include the ASTRON®hf reactive gas generator designed to clean undesired deposits from interior walls of CVD process chambers. By generating atomic fluorine that reacts with waste deposits in the chamber, new gases are formed that are readily scrubbed to minimize the environmental impact. In addition, the field-proven ASTRON®hf remote source reduces wear and tear on the process chamber compared to other cleaning methods.
Visit www.mksinst.com for product details and data sheets.
Need Help? Contact an Applications Specialist by sending an email to [email protected] or call 978-645-5500.
