Thin-film dichroic filters for dense dielectric optical coatings in space applications introduced by Alluxa

Summary points:

• Alluxa debuts Sirrus Plasma PVD process for producing dense dielectric optical coatings with low stress on thin substrates.
• ULTRA series thin-film dichroic filters now feature improved flatness performance, steep edges, and high transmission with reduced design constraints.
• Low-stress coatings support ultra-flat dichroics on substrates under 1 millimeter, enabling advanced microscopy, medical, and space applications.

SANTA ROSA, Calif. – Alluxa Inc. in Santa Rosa, Calif., is introducing the Sirrus Plasma Physical Vapor Deposition (PVD) process that enables dense dielectric optical coatings with low stress on thin substrates.

The ULTRA series thin-film dichroic filters offer a low-stress alternative with flatness performance. The same Alluxa ULTRA series steep edges, high transmission, and reflection is available with improved intrinsic stress for fewer design constraints and optimal instrument performance.

The low-stress Sirrus coating process enables ultra-flat dichroics on substrates thinner than 1 millimeter for an array of microscopy, medical, and space applications. For more information contact Alluxa online at https://alluxa.com/.