Alluxa Introduces Breakthrough ULTRA Low-Stress Dichroic Deposition Process for Thin Substrates
Company will highlight new ULTRA Low-Stress Dichroic process at SPIE Optics + Photonics in booth #735, San Diego Covention Center, August 5 – 7, 2025.
Santa Rosa, Calif. – August 5, 2025 – Alluxa, Inc., a global leader in high-performance optical coatings, filters, and thin-film deposition technologies, is pleased to announce a breakthrough using its proprietary Sirrus™ Plasma Physical Vapor Deposition (PVD) process that enables fully dense dielectric optical coatings with very low stress on thin substrates.
The innovative ULTRA Series thin-film dichroic filters are enhanced to offer a lower-stress alternative with industry-leading flatness performance. The same Alluxa ULTRA Series steep edges, high transmission, and superior reflection is available with improved intrinsic stress, resulting in fewer design constraints and optimal instrument performance. The new low-stress Sirrus coating process enables ultra-flat dichroics on substrates <1.0 mm, ideal for an array of microscopy, medical, and space-based applications.
Peter Egerton, President of Alluxa notes, “We are excited to bring a new capability like this to our customers. High performance, steep edge dichroics on ultra-thin substrates has been a frequent request over the years and the engineering team has worked hard to conceptualize and innovate a solution.”
To learn more, please visit Alluxa’s booth #735 at SPIE Optics + Photonics, August 5 – 7, 2025 at the San Diego Convention Center. For additional information on Alluxa’s ULTRA Series Dichroic Filters, please go to: Dichroic Filters - ULTRA Series Optical Filters - Alluxa.
Alluxa (www.alluxa.com – Santa Rosa, CA) designs and manufactures next generation, hard-coated optical filters using a proprietary plasma deposition process. The company’s unique, purpose-built deposition platform and control systems were designed, developed, and built by our team to address the demanding requirements of the next generation of systems and instruments. Our objectives are to increase production capability and continue to provide > 99% on-time delivery while creating the world’s most challenging filters at breakthrough price points.